CNF is a uniquely capable nanofabrication facility enabling researchers to investigate quantum materials, quantum devices, and quantum systems.
Dry Etching
Oxford Cobra ALE Quantum
Atomic Layer Etching (or ALE) is an advanced etch technique that allows for excellent depth control on shallow features. As device feature size reduces further and further ALE is required to achieve the accuracy required for peak performance. This tool is configured for etching materials used in quantum devices such as Niobium and Tantalum.
Physical Vapor Deposition
AJA Quantum Materials Deposition System
The AJA Quantum Materials Deposition System is a multifunctional phyisical vapor deposition that is dedicated to quantum materials research activities. The tool has a loadlock with in situ ion mill and controlled oxidation system capable of oxidizing films at 10 and 100 Torr. The main chamber has 3 standard magnetron sputter sources and an adjustable proximity sputter source. The chamber also has an in situ ion mill for substrate cleaning and a 6 pocket electron beam evaporation system with a loadlocked crucible exchange
AJA Quantum Materials Sputter Deposition System
The AJA Quantum Materials Sputter Deposition System is a loadlocked UHV sputter deposition system equipped with a variety of functionalities to enable the creation of next generation quantum devices. Unique to this system is the ability to perform low energy sputter deposition via two adjustable distance, opposing sputter sources positioned perpendicular to the substrate.
Angstrom-Q
This tool was designed for the deposition and oxidation of thin films to create Josephson Junctions.
Plasma CVD and ALD Tools
Seki Diamond CVD
CVD tool for depositing CVD polycrystalline and crystalline diamond for Quantum applications on 2" substrates.