Angstrom UHV Ebeam Evaporator

Applications

This Ebeam evaporator will be configured specifically to support the Quantum Sci & Technology focus area, supporting a very limited array of materials for ultra-clean films. This UHV deposition system will be used to deposit quantum qubit PVD thin materials and will have in-situ oxidation capabilities to directly form Josephson Junction in situ.

Capabilities

Ion Milling and Oxidation Chamber
A load lock
In-chamber pellet feeder
4 X 40 cc pockets: 2x Al, Ti, Ta
Variable Angle Deposition Stage with Backside Substrate Heating
Supports sample sizes up to 150 mm

Estimated Arrival

March 2025

Projected Availability

June 2025