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Attached photoacid generator in end-capped chain scissionable photoresist for EUV lithography

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Attached photoacid generator in end-capped chain scissionable photoresist for EUV lithography

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Madan R. Biradar

Huseyin Cem Kiliclar

Christopher K. Ober

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Attached photoacid generator in end-capped chain scissionable photoresist for EUV lithography

This material is based upon work supported by the National Science Foundation under Grant No. NNCI-2025233. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

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