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Continuous Operation Lithography-free Photonics in the Linear and Nonlinear Regime

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Continuous Operation Lithography-free Photonics in the Linear and Nonlinear Regime

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Benjamin A. Ash

Ryotatsu Yanagimoto

Martin M. Stein

Yiqi Zhao

Tatsuhiro Onodera

Peter L. McMahon

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Continuous Operation Lithography-free Photonics in the Linear and Nonlinear Regime

This material is based upon work supported by the National Science Foundation under Grant No. NNCI-2025233. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

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