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MOS Clean Hoods

Wet Deck for SC-1, SC-2 cleaning of wafers

MOS Clean Wet Decks
Manager: Phil Infante
Backup: Aaron Windsor


The hot process area has two wet decks for RCA cleaning of substrates prior to loading into the furnaces. Dedicated dump rinsers with spin rinse dryers give 30 minute clean times for wafers. A HF dip is available for removal of native oxides prior to deposition. The tanks are sized to handle a full boat of 100 mm wafers.

The RCA clean is for Silicon wafers only.


  • 18 Mohm DI water
  • SC-1, SC-2 temperature controlled baths
  • HF tank for native oxide removal

Additional Resources:

Location of tool in cleanroom (jpg)

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