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FilMetrics Film Measurement Systems

F40 / F50-EXR Optical Measurement Systems for transparent thin film measurement

FilMetrics F50
Manager: Tom Pennell
Backup: Garry Bordonaro


The two FilMetrics systems at the CNF can measure optically transparent films.

The F50-EXR system can be used for measurements of thickness, refractive index(n), and dispersion(k), as well as wafer mapping of any of these properties from 30 nm up to 250 micron.

The F40 system is attached to a microscope for film thickness measurement from 20 nm to 20 microns with a measurement spot size ranging from 100 to 10 microns square. The use of the microscope allows you to make measurements on specific features of your pattern devices.

For both systems, a film model must be available that gives the n & k of the film over the optical wavelength range of the tool (200 - 850 nm doe the F40 and 380 nm - 1700 nm for the F50-EXR). For new films, the Woollam Spectroscopic Ellipsometer can give a thorough analysis and generate the required data so that the faster FilMetrics can be used for thickness mapping and other measurements.

Additional Resources:

Equipment Information Sheet - F40
Equipment Information Sheet - F50

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