Button: Contact CNFButton: MultimediaButton: About CNF
Button: Getting StartedButton: PublicationButton: REU ProgramButton: Events & SeminarsButton: Education OutreachButton: TechnologiesButton: Lab Equipment

Button: Lab User


E-Beam Lithography Hotplates

Hot plates for baking electron beam lithography resist

Backup: Amrita Banerjee , Alan R. Bleier

Description:

Hot plates for use in baking resist for ebeam lithography

Capabilities:

  • 1 hot plate at 170°C strictly for baking PMMA
  • 1 general use vacuum oven up to 120°C
  • 4 general use hot plates for ebeam lithography up to 225°C




Back to Top




Button: Search Button: Search Keywords
Cornell University
NYSTARNNCINSF