Button: Contact CNFButton: MultimediaButton: About CNF
Button: Getting StartedButton: PublicationButton: REU ProgramButton: Events & SeminarsButton: Education OutreachButton: TechnologiesButton: Lab Equipment

Button: Lab User


TFT LPCVD LTO410 - A3

MRL Industries Furnace for low temperature oxide depositions on TFT compatible substrates

MRL Furnace
Manager: Phil Infante
Backup: Aaron Windsor

Description:

The TFT Low Temperature Oxide furnace is a low pressure CVD furnace with a 40” flat zone capable of processing up to 6” diameter wafers. Process gases used are SiH4 and O2 for silane base oxides and diethysilane (LTO410) for liquid source based oxide. Samples are restricted to silicon and TFT compatible glass materials only.

Capabilities:

  • Low temperature deposited oxide
  • 20 nm/min dep rate at 425°C
  • LTO 410 deposited oxide at 400°C


Additional Resources:

Location of tool in cleanroom (jpg)


Back to Top




Button: Search Button: Search Keywords
Cornell University
NYSTARNNCINSF