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Anatech Resist Strip
Anatech Plasma Asher Manager: Jerry Drumheller
Backup: Christopher Alpha
, Daniel McCollister
Description:The Anatech USA, model SCE-110-RF, Oxygen plasma Asher is a 10 inch diameter all quartz barrel asher. It is ICP powered 13.56 MHz up to 1000 Watts. It is equipped for both oxygen and nitrogen plasma. Capabilities:The touch screen controller is configured to run up to 3 step processes, and the first step can be programmed to terminate at a temperature set point on a chamber probe. Processes Available:Applications:Typically wafer descum after developing resist, and stripping resist after an etch. Back to Top |
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![]() This material is based upon work supported by the National Science Foundation under Grant No. NNCI-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. If you have a disability and are having trouble accessing information on this website or need materials in an alternate format, contact web-accessibility@cornell.edu for assistance. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |