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Anatech Resist Strip

Anatech Plasma Asher

Anatech USA, model SCE-110-RF
Manager: Jerry Drumheller
Backup: Christopher Alpha , Daniel McCollister

Description:

The Anatech USA, model SCE-110-RF, Oxygen plasma Asher is a 10 inch diameter all quartz barrel asher. It is ICP powered 13.56 MHz up to 1000 Watts. It is equipped for both oxygen and nitrogen plasma.

Capabilities:

The touch screen controller is configured to run up to 3 step processes, and the first step can be programmed to terminate at a temperature set point on a chamber probe.

Processes Available:

Applications:

Typically wafer descum after developing resist, and stripping resist after an etch.




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This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

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