Button: Contact CNFButton: MultimediaButton: About CNF
Button: Getting StartedButton: PublicationButton: REU ProgramButton: Events & SeminarsButton: Education OutreachButton: TechnologiesButton: Lab Equipment

Button: Lab User

TFT Wet/Dry Oxide - A2

MRL Industries Furnace for thermal oxidation of TFT compatible substrates

Manager: Phil Infante
Backup: Aaron Windsor , Daniel McCollister


The TFT Oxide Furnace is an atmospheric furnace with a 42” flat zone capable of processing up to 6” diameter wafers. The furnace tube is equipped with an external torch for pyrogenic wet oxidation,O2 for dry oxidation and O2/inert mixtures, as well as an N2 anneal ambient. Samples are restricted to silicon or TFT based materials only.


  • Wet and dry oxidation
  • HCL during oxidation up to a 4% level
  • Anneals in N2 ambient
  • Pieces to 6” diameter wafers can be processed
  • Maximum temperature of 1100°C

Additional Resources:

Location of tool in cleanroom (jpg)

Back to Top

Button: Search Button: Search Keywords
Cornell University