JEOL JBX-6300FS 100 kV Electron Beam Lithography System
Manager: Alan R. BleierBackup: Amrita Banerjee , John Treichler
The unique capability of the JEOL 6300 is that a fifth lens can be used to get a smaller beam spot size and write sub-10 nm features. This is the high resolution writing mode. Writing without the 5th lens in 4th lens mode is called the high speed writing mode.
Additional Resources:Shot pitch and write time estimation spreadsheet
JEOL Alignment Mark Requirements
Offset calculator for aligned exposures
Back to Top
This material is based upon work supported by the National Science Foundation under Grant No. NNCI-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
If you have a disability and are having trouble accessing information on this website or need materials in an alternate format, contact firstname.lastname@example.org for assistance.
Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: email@example.com
Powered by ITX