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CMOS Wet Oxide - E2

CMOS Wet Oxidation Furnace

Manager: Phil Infante
Backup: Aaron Windsor , Daniel McCollister

Description:

The CMOS Wet Oxidation Furnace is an atmospheric furnace with a 40” flat zone capable of processing up to 6” diameter wafers. The furnace tube is equipped with an external torch for pyrogenic wet oxidation, high and low O2 flow controllers for dry oxidation and O2/inert mixtures, as well as N2 and Ar anneal ambient. Samples are restricted to silicon based materials only and CMOS limited films and tools.


Additional Resources:

Location of tool in cleanroom (jpg)


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