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Phosphorus Doping - D2

Solid source phosphorus diffusion tube

Manager: Phil Infante
Backup: Aaron Windsor , Daniel McCollister


The Phosphorus Doping Furnace is an atmospheric furnace with a 40” flat zone capable of processing up to 6” diameter wafers. The furnace tube is configured for utilizing solid source wafers for silicon doping. The furnace is restricted to silicon materials.

Processes Available:

Solid Source diffusion on phosphorus into silicon wafers or polysilicon films.

Additional Resources:

Location of tool in cleanroom (jpg)

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