Cr ICP system
Manager: Jeremy ClarkBackup: Tom Pennell , Vince Genova
Trion Minilock III is an RIE/ICP system who purpose is to etch Chrome.
The system has both chlorinated and fluorinated gases and is capable of handling up to 8-inch wafers and 7" square plates.
Chrome etch processes are presently available on the tool.
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This material is based upon work supported by the National Science Foundation under Grant No. NNCI-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
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Cornell NanoScale Science & Technology Facility (CNF)
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