Button: Contact CNFButton: MultimediaButton: About CNF
Button: Getting StartedButton: PublicationButton: REU ProgramButton: Events & SeminarsButton: Education OutreachButton: TechnologiesButton: Lab Equipment

Button: Lab User

Zeiss Ultra SEM

Ultra High Resolution Field Emission SEM

Zeiss Ultra SEM Backup: John Treichler , Amrita Banerjee


Scanning electron microscopy is critical for the analysis of nanoscale materials and structures. CNF operates two field emission scanning electron microscopes (SEMs): a Zeiss Supra 55 microscope capable of variable pressure (VP) operation and a Zeiss Ultra 55 microscope optimized for high resolution imaging. Like most modern SEMs, both systems are capable of operating at beam energies from 100 V to 30 kV. However, the unique electron optical design employed in the Zeiss systems enables unsurpassed performance at beam energies from 100 V to 8 kV. This is crucial for obtaining high resolution distortion free images of surface.

The Ultra 55 is designed to maximize imaging resolution at low beam energies. It is equipped with a backscatter electron detector engineered to image electrons with energies less than 2 keV. An energy filter incorporated into the detector enables energy selective backscatter (ESB) imaging. This signal can be used to obtain contrast between regions of different composition.


  • In Lens Energy Selective Backscatter (ESB) Detector
  • Backscatter imaging using 100 eV to 3 keV beam energies
  • In situ electrical characterization of samples using the installed Zyvex system

Additional Resources:

CNF SEM basics
JEOL guide to SEM
CNF SEM video training reference
Location of tool in cleanroom (jpg)

Back to Top

Button: Search Button: Search Keywords
Cornell University