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Click the tool name for detailed information.
ETCHING
Acid Etching Tanks 
Tanks for hot Phosphoric acid and Nanostrip etching of wafers
Anatech Resist Strip 
Anatech Plasma Asher
Aura 1000 Resist Strip 
Gasonics downstream asher for dry stripping of photoresist
Branson Resist Strip 
Oxygen plasma barrel asher for Photoresist/organic removal
Glen 1000 Resist Strip 
Oxygen Plasma tool for removal of organics
Hamatech Hot Piranha 
Automatic Wafer Processor for SC-1 & Piranha cleans
Hamatech Hot SC1/SC2 
Automatic Single Wafer Processor for SC-1 & SC-2 cleans
KOH Etching 
A heated bath of Potassium Hydroxide (KOH)
Oxford 100 Etcher 
Oxford PlasmaLab 100 RIE System for fluorine based ICP deep SiO2/glass etching
Oxford 81 Etcher 
Oxford PlasmaLab 80+ RIE System for fluorine based etching of oxide, nitride, & silicon
Oxford 82 Etcher 
with endpoint detection
Oxford Cobra ICP Etcher 
Oxford Cobra HBr etcher
Primaxx Vapor HF Etcher 
Vapor HF Isotropic Release Etching
PT72 Etcher 
PlasmaTherm 72 Fluorine based Reactive Ion Etcher
PT720-740 Etcher 
PlasmaTherm720/740 Chlorine-based RIE system for Silicon & Aluminum etching
PT770 Etcher 
PlasmaTherm 770 two chamber inductively coupled plasma etching system for plasma etching using Chlorine or Fluorine
Trion Etcher 
Cr ICP system
Unaxis 770 Deep Si Etcher 
Bosch Etcher for deep silicon etching
Xactix Xenon Difluoride Etcher 
Xactix XeF2 Isotropic silicon etch system
YES Asher 
YES CV200RFS Oxygen Plasma Asher


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